Pattern matching (PM) was first introduced as the semiconductor industry began to shift from simple one-dimensional rule checks to the two-dimensional checks required by sub-resolution lithography.

This file type includes high resolution graphics and schematics. IC physical verification (i.e., design rule checking or “DRC”) used to be easy. In the good old days, you could run some ...

Unlock the full InfoQ experience by logging in! Stay updated with your favorite authors and topics, engage with content, and download exclusive resources. Dany Lepage discusses the architectural ...

The software, called PatMax, locates features despite changes in image angle, size, rotation, and appearance. Boasting up to 10 times more accuracy than other pattern-matching technologies, the ...